Self-formation of GaN hollow nanocolumns by inductively coupled plasma etching
- 作者S.C. Hung; Y.K. Su; S.J. Chang; S.C. Chen; L.W. Ji; T.H. Fang; L.W. Tu; M. Chen
- 卷第80卷
- 期第8期
- 印刷ISSN0947-8396
- 电子ISSN1432-0630
- 文件大小342.89KB
- 发表时间2005-05
- DOI10.1007/s00339-005-3219-z
- 页码1607-1610
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