海量图书期刊资源,随时随地畅享阅读乐趣
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water.Kaupo Kukli; Mikko Ritala; Markku Leskelae; Timo Sajavaara; Juhani Keinonen; Anthony C. Jones; Neil L. Tobin · 2004
ChemInform Abstract: Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition.Mikko Ritala; Pia Kalsi; Diana Riihelae; Kaupo Kukli; Markku Leskelae; Janne Jokinen · 1999