Electrochemical Cu Nanoparticle Deposition on TaSiN Diffusion Barrier Films
- 期刊名称Journal of The Electrochemical Society
- 作者Li, Jingye; You, Shaoxin; O’Keefe, Matthew J.; O’Keefe, Thomas J.
- 卷第153卷
- 期第10期
- 印刷ISSN0013-4651
- 文件大小1915.78KB
- 发表时间2006
- DOI10.1149/1.2335616
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