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Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique bombardment

Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique bombardment

B. Fares; B. Gautier; Ph. Holliger; N. Baboux; G. Prudon; J.-Cl. Dupuy

作者B. Fares; B. Gautier; Ph. Holliger; N. Baboux; G. Prudon; J.-Cl. Dupuy
卷第253卷
期第5期
印刷ISSN0169-4332
文件大小679.21KB
发表时间2006
DOI10.1016/j.apsusc.2006.05.034
页码2662-2670

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