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[IEEE The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. - Traverse City, MI, USA (2006.06.4-2006.06.8)] The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. - Characterization of materials with low secondary electron yield for use in high-power microwave devices

[IEEE The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. - Traverse City, MI, USA (2006.06.4-2006.06.8)] The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. - Characterization of materials with low secondary electron yield for use in high-power microwave devices

Kumar, P.; Svimonishvili, T.; Watts, C.; Gilmore, M.; Bowers, L.; Gaudet, J.; Schamiloglu, E.
  • 作者Kumar, P.; Svimonishvili, T.; Watts, C.; Gilmore, M.; Bowers, L.; Gaudet, J.; Schamiloglu, E.
  • 文件大小130.17KB
  • 发表时间2006
  • DOI10.1109/plasma.2006.1707197
  • 页码324-324
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