Composition dependence of band offsets for (LaAlO[sub 3])[sub 1−x](Al[sub 2]O[sub 3])[sub x] gate dielectrics determined by photoelectron spectroscopy and x-ray absorption spectroscopy

Yasuhara, R.; Komatsu, M.; Takahashi, H.; Toyoda, S.; Okabayashi, J.; Kumigashira, H.; Oshima, M.; Kukuruznyak, D.; Chikyow, T.

期刊名称Applied Physics Letters
作者Yasuhara, R.; Komatsu, M.; Takahashi, H.; Toyoda, S.; Okabayashi, J.; Kumigashira, H.; Oshima, M.; Kukuruznyak, D.; Chikyow, T.
卷第89卷
期第12期
印刷ISSN0003-6951
文件大小269.25KB
发表时间2006
DOI10.1063/1.2356377

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