[IEEE 2006 International SiGe Technology and Device Meeting - Princeton, NJ, USA ()] 2006 International SiGe Technology and Device Meeting - Uniaxial and Biaxial Strain for CMOS Performance Enhancement
Nguyen, B.-Y.; Zhang, D.; Thean, A.; Grudowski, P.; Vartanian, V.; White, T.; Zollner, S.; Theodore, D.; Goolsby, B.; Desjardins, H.; Prabhu, L.; Garcia, R.; Hackenberg, J.; Dhandapani, V.; Murphy, S.; Rai, R.; Conner, J.; Montgomery, P.; Parker, C.; Hildreth, J.; Noble, R.; Jahanbani, M.; Eades, D.; Cheek, J.; White, B.; Mogab, J.; Venkatesan, S.
- 作者Nguyen, B.-Y.; Zhang, D.; Thean, A.; Grudowski, P.; Vartanian, V.; White, T.; Zollner, S.; Theodore, D.; Goolsby, B.; Desjardins, H.; Prabhu, L.; Garcia, R.; Hackenberg, J.; Dhandapani, V.; Murphy, S.; Rai, R.; Conner, J.; Montgomery, P.; Parker, C.; Hildreth, J.; Noble, R.; Jahanbani, M.; Eades, D.; Cheek, J.; White, B.; Mogab, J.; Venkatesan, S.
- 文件大小2698.03KB
- 发表时间2006
- DOI10.1109/istdm.2006.246545
- 页码1-3