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Dislocation Density and Critical Current Density of Sm
<sub/>
1+
<i>x</i>
</sub>
Ba
<sub/>
2-
<i>x</i>
</sub>
Cu
<sub/>3</sub>
O
<sub/><i>y</i>
</sub>
Films Prepared by Various Fabrication Processes

Dislocation Density and Critical Current Density of Sm _{1+
x} Ba _{2-
x} Cu ₃ O _y Films Prepared by Various Fabrication Processes

Miura, Masashi; Yoshida, Yutaka; Ichino, Yusuke; Ozaki, Toshinori; Takai, Yoshiaki; Matsumoto, Kaname; Ichinose, Ataru; Horii, Shigeru; Mukaida, Masashi

期刊名称Japanese Journal of Applied Physics
作者Miura, Masashi; Yoshida, Yutaka; Ichino, Yusuke; Ozaki, Toshinori; Takai, Yoshiaki; Matsumoto, Kaname; Ichinose, Ataru; Horii, Shigeru; Mukaida, Masashi
卷第45卷
印刷ISSN0021-4922
文件大小226.43KB
发表时间2006-7-7
DOI10.1143/jjap.45.l701

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