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Comparison of ultrathin SiO[sub 2]∕Si(100) and SiO[sub 2]∕Si(111) interfaces from soft x-ray photoelectron spectroscopy

Comparison of ultrathin SiO[sub 2]∕Si(100) and SiO[sub 2]∕Si(111) interfaces from soft x-ray photoelectron spectroscopy

M. D. Ulrich; J. E. Rowe; J. W. Keister; H. Niimi; L. Fleming; G. Lucovsky

作者M. D. Ulrich; J. E. Rowe; J. W. Keister; H. Niimi; L. Fleming; G. Lucovsky
卷第24卷
期第4期
文件大小562.17KB
发表时间2006
DOI10.1116/1.2218865

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