Intermixing of Ge and Si during exposure of GeH4 on Si

• 作者Gen Watari; Noritaka Usami; Yoshitaro Nose; Kozo Fujiwara; Gen Sazaki; Kazuo Nakajima
• 卷第508卷
• 印刷ISSN0040-6090
• 文件大小132.86KB
• 发表时间2006
• DOI10.1016/j.tsf.2005.08.403
• 页码163-165