[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - Prospect of Hf-Based Gate Dielectric by PVD with FUSI Gate for LSTP Application

Niwa, Masaaki; Mitsuhashi, Riichirou; Hayashi, Shigenori; Yamamoto, Kazuhiko; Harada, Yoshinao; Kubota, Masafumi; Rothchild, Aude; Hoffmann, Thomas; Kubicek, Stefan; De Gendt, S.; Heyns, Marc; Lauwers, Anne; Biesemans, Serge; Kittle, Jorge

作者Niwa, Masaaki; Mitsuhashi, Riichirou; Hayashi, Shigenori; Yamamoto, Kazuhiko; Harada, Yoshinao; Kubota, Masafumi; Rothchild, Aude; Hoffmann, Thomas; Kubicek, Stefan; De Gendt, S.; Heyns, Marc; Lauwers, Anne; Biesemans, Serge; Kittle, Jorge
卷第1卷
文件大小2286.93KB
发表时间2006
DOI10.1149/1.2209276
页码269-285

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[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - Prospect of Hf-Based Gate Dielectric by PVD with FUSI Gate for LSTP Application