SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - First performance results of the ASML alpha demo tool
Meiling, Hans; Meijer, Henk; Banine, Vadim; Moors, Roel; Groeneveld, Rogier; Voorma, Harm-Jan; Mickan, Uwe; Wolschrijn, Bas; Mertens, Bas; van Baars, Gregor; Kürz, Peter; Harned, Noreen; Lercel, Michael J.
- 作者Meiling, Hans; Meijer, Henk; Banine, Vadim; Moors, Roel; Groeneveld, Rogier; Voorma, Harm-Jan; Mickan, Uwe; Wolschrijn, Bas; Mertens, Bas; van Baars, Gregor; Kürz, Peter; Harned, Noreen; Lercel, Michael J.
- 卷第6151卷
- 印刷ISSN0277-786X
- 文件大小623.42KB
- 发表时间2006
- DOI10.1117/12.657348