Investigation of Molybdenum Nitride Gate on SiO[sub 2] and HfO[sub 2] for MOSFET Application
Tsui, Bing-Yue; Huang, Chih-Feng; Lu, Chih-Hsun
- 期刊名称Journal of The Electrochemical Society
- 作者Tsui, Bing-Yue; Huang, Chih-Feng; Lu, Chih-Hsun
- 卷第153卷
- 期第3期
- 印刷ISSN0013-4651
- 文件大小259.40KB
- 发表时间2006
- DOI10.1149/1.2158576