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Characteristics of HfO[sub 2] thin films deposited by plasma-enhanced atomic layer deposition using O[sub 2] plasma and N[sub 2]O plasma

Characteristics of HfO[sub 2] thin films deposited by plasma-enhanced atomic layer deposition using O[sub 2] plasma and N[sub 2]O plasma

S. Kim; J. Kim; J. Choi; H. Kang; H. Jeon; C. Bae

作者S. Kim; J. Kim; J. Choi; H. Kang; H. Jeon; C. Bae
文件大小569.62KB
发表时间2006
DOI10.1116/1.2188405

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