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Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic

Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic

J. P. Cain; P. P. Naulleau; E. M. Gullikson; C. J. Spanos

作者J. P. Cain; P. P. Naulleau; E. M. Gullikson; C. J. Spanos
文件大小435.61KB
发表时间2006
DOI10.1116/1.2194946

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