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Dependence of CoSi2Sheet Resistance on Cobalt Thickness for Gate Lengths of 50 nm or Less

Dependence of CoSi2Sheet Resistance on Cobalt Thickness for Gate Lengths of 50 nm or Less

K. Kawamura; T. Saiki; R. Nakamura

作者K. Kawamura; T. Saiki; R. Nakamura
文件大小260.54KB
发表时间2006
DOI10.1143/JJAP.45.3972

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