Characterization of Argon Fast Atom Beam Source and Application to Mesa Etching Process for GaInP/GaAs Triple-Barrier Resonant Tunneling Diodes
- 期刊名称Japanese Journal of Applied Physics
- 作者Suhara, Michihiko; Matsuzaka, Norihiko; Fukumitsu, Masakazu; Okumura, Tsugunori
- 卷第45卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小174.95KB
- 发表时间2006-6-20
- DOI10.1143/JJAP.45.5504
- 页码5504-5508
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