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Characteristics of nanostructured Ag films by the reduction of sputtered AgOx thin films

Characteristics of nanostructured Ag films by the reduction of sputtered AgOx thin films

T. Arai; C. Rockstuhl; P. Fons; K. Kurihara; T. Nakano; K. Awazu; J. Tominaga
  • 作者T. Arai; C. Rockstuhl; P. Fons; K. Kurihara; T. Nakano; K. Awazu; J. Tominaga
  • 文件大小233.57KB
  • 发表时间2006
  • DOI10.1088/0957-4484/17/1/013
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