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Growth and Characterization of Hf–Silicate/Al2O3Gate Stacks Grown on Si(100) by Self-Limiting Atomic Layer Deposition

Growth and Characterization of Hf–Silicate/Al2O3Gate Stacks Grown on Si(100) by Self-Limiting Atomic Layer Deposition

J. Kim; S. Lee; K. Yong

作者J. Kim; S. Lee; K. Yong
文件大小594.14KB
发表时间2006
DOI10.1143/JJAP.45.7080

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