[IEEE 2006 International SiGe Technology and Device Meeting - Princeton, NJ, USA (15-17 May 2006)] 2006 International SiGe Technology and Device Meeting - Ge/Si
- 作者Isella, G.; Osmond, J.; Kummer, M.; Kaufmann, R.; von Kanel, H.
- 文件大小1706.09KB
- 发表时间2006
- DOI10.1109/istdm.2006.1715953
- 页码1-2
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