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[IEEE 2006 International Workshop on Junction Technology - Shanghai, China (15-16 May 2006)] 2006 International Workshop on Junction Technology - Feasibility Study of Solid-phase Epitaxial Regrowth (SPER) as an Ultra-shallow Junction (USJ) Technology for High-performance CMOS Devices

[IEEE 2006 International Workshop on Junction Technology - Shanghai, China (15-16 May 2006)] 2006 International Workshop on Junction Technology - Feasibility Study of Solid-phase Epitaxial Regrowth (SPER) as an Ultra-shallow Junction (USJ) Technology for High-performance CMOS Devices

Miyashita, T.; Ookoshi, K.; Okabe, K.; Minakata, H.; Suzuki, K.; Aoyama, T.

作者Miyashita, T.; Ookoshi, K.; Okabe, K.; Minakata, H.; Suzuki, K.; Aoyama, T.
文件大小4318.25KB
发表时间2006
DOI10.1109/iwjt.2006.1669455
页码92-95

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