SPIE Proceedings [SPIE Microelectronics, MEMS, and Nanotechnology - Brisbane, Australia (Sunday 11 December 2005)] Device and Process Technologies for Microelectronics, MEMS, and Photonics IV - Fabrication of submicron three-dimensional structure by plane-pattern to the cross-section transfer method using synchrotron radiation lithography
Kato, Fumiki; Fujinawa, Shinya; Tsudo, Makoto; Sugiyama, Susumu; Chiao, Jung-Chih; Dzurak, Andrew S.; Jagadish, Chennupati; Thiel, David V.
- 作者Kato, Fumiki; Fujinawa, Shinya; Tsudo, Makoto; Sugiyama, Susumu; Chiao, Jung-Chih; Dzurak, Andrew S.; Jagadish, Chennupati; Thiel, David V.
- 卷第6037卷
- 印刷ISSN0277-786X
- 文件大小1158.83KB
- 发表时间2006
- DOI10.1117/12.638600