[IEEE 2006 International SiGe Technology and Device Meeting - Princeton, NJ, USA (15-17 May 2006)] 2006 International SiGe Technology and Device Meeting - Ge/Si
Isella, G.; Osmond, J.; Kummer, M.; Kaufmann, R.; von Kanel, H.
- 作者Isella, G.; Osmond, J.; Kummer, M.; Kaufmann, R.; von Kanel, H.
- 文件大小1706.09KB
- 发表时间2006
- DOI10.1109/istdm.2006.1662564
- 页码1-2