Comparison of metal-organic chemical vapour deposition TiN thin films with different process cycles
- 期刊名称Semiconductor Science and Technology
- 作者Yi, Leeward; Zhang, Wenjie; Wu, Jin; Mao, Duli
- 卷第21卷
- 期第3期
- 印刷ISSN0268-1242
- 电子ISSN1361-6641
- 文件大小824.56KB
- 发表时间2006-03-01
- DOI10.1088/0268-1242/21/3/006
- 页码250-253
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