The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering
- 作者K. Eufinger; E.N. Janssen; H. Poelman; D. Poelman; R. De Gryse; G.B. Marin
- 卷第515卷
- 期第2期
- 印刷ISSN0040-6090
- 文件大小394.51KB
- 发表时间2006
- DOI10.1016/j.tsf.2005.12.247
- 页码425-429
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