Characterization of the Ultrathin HfO2 and Hf-Silicate Films Grown by Atomic Layer Deposition

• 作者Tze Chiang Chen; Cheng-Yi Peng; Chih-Hung Tseng; Ming-Han Liao; Mei-Hsin Chen; Chih-I Wu; Ming-Yau Chern; Pei-Jer Tzeng; Chee Wee Liu
• 卷第54卷
• 期第4期
• 印刷ISSN0018-9383
• 电子ISSN1557-9646
• 文件大小592.43KB
• 发表时间2007
• DOI10.1109/ted.2007.892012
• 页码759-766