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Effect of Process Pressure on Atomic Layer Deposition of Al[sub 2]O[sub 3]

Effect of Process Pressure on Atomic Layer Deposition of Al[sub 2]O[sub 3]

Li, Ming-Yen; Chang, Yung-Yuan; Wu, Hsiao-Che; Huang, Cheng-Sung; Chen, Jen-Chung; Lue, Jen-Lang; Chang, Shieh-Ming
  • 期刊名称Journal of The Electrochemical Society
  • 作者Li, Ming-Yen; Chang, Yung-Yuan; Wu, Hsiao-Che; Huang, Cheng-Sung; Chen, Jen-Chung; Lue, Jen-Lang; Chang, Shieh-Ming
  • 卷第154卷
  • 期第11期
  • 印刷ISSN0013-4651
  • 文件大小728.17KB
  • 发表时间2007
  • DOI10.1149/1.2778861
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