Electromigration behavior of 60 nm dual damascene Cu interconnects
- 期刊名称Journal of Applied Physics
- 作者Pyun, Jung Woo; Baek, Won-Chong; Zhang, Lijuan; Im, Jay; Ho, Paul S.; Smith, Larry; Smith, Gregory
- 卷第102卷
- 期第9期
- 印刷ISSN0021-8979
- 文件大小605.20KB
- 发表时间2007
- DOI10.1063/1.2805425
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