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Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

Yang, Yang; Kushner, Mark J.
  • 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • 作者Yang, Yang; Kushner, Mark J.
  • 卷第25卷
  • 期第5期
  • 印刷ISSN0734-2101
  • 文件大小3640.51KB
  • 发表时间2007
  • DOI10.1116/1.2771558
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