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Nucleation of HfO[sub 2] atomic layer deposition films on chemical oxide and H-terminated Si

Nucleation of HfO[sub 2] atomic layer deposition films on chemical oxide and H-terminated Si

Hackley, Justin C.; Gougousi, Theodosia; Demaree, J. Derek

期刊名称Journal of Applied Physics
作者Hackley, Justin C.; Gougousi, Theodosia; Demaree, J. Derek
卷第102卷
期第3期
印刷ISSN0021-8979
文件大小1024.03KB
发表时间2007
DOI10.1063/1.2764223

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