X-ray reflectometry and spectroscopic ellipsometry characterization of Al2O3 atomic layer deposition on HF-last and NH3 plasma pretreatment Si substrates
- 期刊名称Journal of Materials Research
- 作者Lu, Hong-Liang; Xu, Min; Ding, Shi-Jin; Chen, Wei; Zhang, David Wei; Wang, Li-Kang
- 卷第22卷
- 期第5期
- 印刷ISSN0884-2914
- 电子ISSN2044-5326
- 文件大小188.39KB
- 发表时间2007-5
- DOI10.1557/jmr.2007.0184
- 页码1214-1218
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