Stress evolution during Ni–Si compound formation for fully silicided (FUSI) gates
C. Torregiani; C. Van Bockstael; C. Detavernier; C. Lavoie; A. Lauwers; K. Maex; J.A. Kittl
- 作者C. Torregiani; C. Van Bockstael; C. Detavernier; C. Lavoie; A. Lauwers; K. Maex; J.A. Kittl
- 卷第84卷
- 期第11期
- 印刷ISSN0167-9317
- 文件大小366.89KB
- 发表时间2007
- DOI10.1016/j.mee.2007.05.054
- 页码2533-2536