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Stress evolution during Ni–Si compound formation for fully silicided (FUSI) gates

Stress evolution during Ni–Si compound formation for fully silicided (FUSI) gates

C. Torregiani; C. Van Bockstael; C. Detavernier; C. Lavoie; A. Lauwers; K. Maex; J.A. Kittl
  • 作者C. Torregiani; C. Van Bockstael; C. Detavernier; C. Lavoie; A. Lauwers; K. Maex; J.A. Kittl
  • 卷第84卷
  • 期第11期
  • 印刷ISSN0167-9317
  • 文件大小366.89KB
  • 发表时间2007
  • DOI10.1016/j.mee.2007.05.054
  • 页码2533-2536
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