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Study of photoresist etching and roughness formation in electron-beam generated plasmas

Study of photoresist etching and roughness formation in electron-beam generated plasmas

B. J. Orf; S. G. Walton; D. Leonhardt; G. S. Oehrlein
  • 作者B. J. Orf; S. G. Walton; D. Leonhardt; G. S. Oehrlein
  • 文件大小555.35KB
  • 发表时间2007
  • DOI10.1116/1.2732741
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