Electric Characteristics of Si3N4Films Formed by Directly Radical Nitridation on Si(110) and Si(100) Surfaces
- 作者M. Higuchi; T. Aratani; T. Hamada; S. Shinagawa; H. Nohira; E. Ikenaga; A. Teramoto; T. Hattori; S. Sugawa; T. Ohmi
- 文件大小352.05KB
- 发表时间2007
- DOI10.1143/JJAP.46.1895
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