[ECS 211th ECS Meeting - Chicago, Illinois (May 6-May 10, 2007)] ECS Transactions - Understanding and Controlling Pore Etching in Semiconductors
- 作者Foell, Helmut; Carstensen, Juergen; Foca, Eugen; Leisner, Malte
- 卷第6卷
- 文件大小1998.23KB
- 发表时间2007
- DOI10.1149/1.2731199
- 页码309-322
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