Fabrication of high aspect ratio nano gratings using SR lithography
- 作者Fumiki Kato; Shinya Fujinawa; Yigui Li; Susumu Sugiyama
- 卷第13卷
- 印刷ISSN0946-7076
- 电子ISSN1432-1858
- 文件大小483.36KB
- 发表时间2007-02
- DOI10.1007/s00542-006-0215-y
- 页码221-225
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