The influence of epitaxial Ti buffer layers for fabricating as-grown films
- 作者T. Oba; P. Sun; Y. Harada; T. Takahashi; H. Iriuda; M. Seki; Y. Nakanishi; S. Noguchi; T. Ishida; M. Yoshizawa
- 卷第310卷
- 印刷ISSN0304-8853
- 文件大小142.80KB
- 发表时间2007
- DOI10.1016/j.jmmm.2006.10.078
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