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Self-Cleaning Properties of TiO<sub>2</sub> Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. Source

Self-Cleaning Properties of TiO₂ Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. Source

Pudwat, S.; Rakkwamsuk, P.; Damrongrattana, S.

期刊名称Advanced Materials Research
作者Pudwat, S.; Rakkwamsuk, P.; Damrongrattana, S.
电子ISSN1662-8985
文件大小630.51KB
发表时间2008
DOI10.4028/www.scientific.net/AMR.55-57.453
页码453-456

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