Nanocrystalline Diamond Films Deposited by the Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method with Different Compositions of CH4/Ar/H2 Gas Mixture

Zeng, L.; Peng, H.; Wang, W.; Chen, Y.; Lei, D.; Qi, W.; Liang, J.; Zhao, J.; Kong, X.; Zhang, H.

期刊名称Journal of Physical Chemistry C
作者Zeng, L.; Peng, H.; Wang, W.; Chen, Y.; Lei, D.; Qi, W.; Liang, J.; Zhao, J.; Kong, X.; Zhang, H.
卷第112卷
期第5期
印刷ISSN1932-7447
文件大小728.98KB
发表时间2008-02-07
DOI10.1021/jp710082n
页码1401-1406

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