[IEEE 2008 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2008.12.15-2008.12.17)] 2008 IEEE International Electron Devices Meeting - Experimental investigation on the origin of direction dependence of Si (110) hole mobility utilizing ultra-thin body pMOSFETs
Shimizu, Ken; Saraya, Takuya; Hiramoto, Toshiro
- 作者Shimizu, Ken; Saraya, Takuya; Hiramoto, Toshiro
- 文件大小316.34KB
- 发表时间2008
- DOI10.1109/iedm.2008.4796615
- 页码1-4