Characteristics of vanadium dioxide films deposited by RF-magnetron sputter deposition technique using V-metal target
- 作者Sun Jin Yun; Jung Wook Lim; Byung-Gyu Chae; Bong Jun Kim; Hyun-Tak Kim
- 卷第403卷
- 印刷ISSN0921-4526
- 文件大小144.77KB
- 发表时间2008
- DOI10.1016/j.physb.2007.10.362
- 页码1381-1383
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