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[IEEE 2008 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Sanya, China (2008.01.6-2008.01.9)] 2008 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Investigation on micromachining technology compatibility of PECVD SiO<inf>2</inf>/Si<inf>3</inf>N<inf>4</inf> double-layer electrets

[IEEE 2008 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Sanya, China (2008.01.6-2008.01.9)] 2008 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Investigation on micromachining technology compatibility of PECVD SiO2/Si3N4 double-layer electrets

Jin Liu, ; Zhiqiu Lv, ; Jinwen Zhang,

作者Jin Liu, ; Zhiqiu Lv, ; Jinwen Zhang,
文件大小113.94KB
发表时间2008
DOI10.1109/nems.2008.4484323
页码223-226

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