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UV photon-induced defect and its control in plasma etching processes

UV photon-induced defect and its control in plasma etching processes

Ishikawa, Yasushi; Ichihashi, Yoshinari; Yamasaki, Satoshi; Samukawa, Seiji

期刊名称Journal of Applied Physics
作者Ishikawa, Yasushi; Ichihashi, Yoshinari; Yamasaki, Satoshi; Samukawa, Seiji
卷第104卷
期第6期
印刷ISSN0021-8979
文件大小573.20KB
发表时间2008
DOI10.1063/1.2980333

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