Tracer diffusion of Cu in CVD β-SiC
- 作者A. Suino; Y. Yamazaki; H. Nitta; K. Miura; H. Seto; R. Kanno; Y. Iijima; H. Sato; S. Takeda; E. Toya; T. Ohtsuki
- 卷第69卷
- 印刷ISSN0022-3697
- 文件大小155.82KB
- 发表时间2008
- DOI10.1016/j.jpcs.2007.07.007
- 页码311-314
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