Deposition of TiAlN coatings using reactive bipolar-pulsed direct current unbalanced magnetron sputtering
- 作者Harish C. Barshilia; K. Yogesh; K.S. Rajam
- 卷第83卷
- 期第2期
- 印刷ISSN0042-207X
- 文件大小1082.97KB
- 发表时间2008
- DOI10.1016/j.vacuum.2008.04.075
- 页码427-434
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