Photoresist coating and patterning for through-silicon via technology
- 作者N. P. Pham; D. S. Tezcan; W. Ruythooren; P. De Moor; B. Majeed; K. Baert; B. Swinnen
- 文件大小1280.72KB
- 发表时间2008
- DOI10.1088/0960-1317/18/12/125008
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