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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - <title>Predictive modeling of lithography-induced linewidth variation</title>

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Predictive modeling of lithography-induced linewidth variation

Kahng, Andrew B.; Muddu, Swamy V.; Horiuchi, Toshiyuki

作者Kahng, Andrew B.; Muddu, Swamy V.; Horiuchi, Toshiyuki
卷第7028卷
印刷ISSN0277-786X
文件大小7199.09KB
发表时间2008
DOI10.1117/12.793029

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