Химические основы молекулярного направления лазерного разделения изотопов (mlis) кремния методом ИК МФД. Зависимость селективности диссоциации sif 3c 2h 3Cl 2 от давления образца как основа масштабирования технологического процесса
- 期刊名称УСПЕХИ В ХИМИИ И ХИМИЧЕСКОЙ ТЕХНОЛОГИИ
- 作者Дементьев П. С.
- 卷第22卷
- 印刷ISSN1506-2017
- 文件大小485.35KB
- 发表时间2008
- DOI10.0000/cyberleninka.ru/article/n/himicheskie-osnovy-molekulyarnogo-napravleniya-lazernogo-razdeleniya-izotopov-mlis-kremniya-metodom-ik-mfd-zavisimost-selektivnosti
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