Remote Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Aluminum Oxide Thin Films
- 作者Ioana Volintiru; Mariadriana Creatore; Johannes L. van Hemmen; Mauritius C. M. van de Sanden
- 卷第5卷
- 期第7期
- 印刷ISSN1612-8850
- 电子ISSN1612-8869
- 文件大小552.65KB
- 发表时间2008
- DOI10.1002/ppap.200700164
- 页码645-652