SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Robust mask design with defocus variation using inverse synthesis

Jia, Ningning; Chen, Alek C.; Lin, Burn; Wong, Alfred K.; Lam, Edmund Y.; Yen, Anthony

作者Jia, Ningning; Chen, Alek C.; Lin, Burn; Wong, Alfred K.; Lam, Edmund Y.; Yen, Anthony
卷第7140卷
印刷ISSN0277-786X
文件大小313.61KB
发表时间2008
DOI10.1117/12.804681

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